Dong Mao, Northwestern Polytechnical University, China
Ralf-Peter, Deutsche Telekom,Germany
Jianjun Yu, ZTE Corporation, China
Koji Igarashi, 1 KDDI R&D Laboratories Inc., Japan, 2 Osaka University, Japan
Silvio Abrate, Istituto Superiore Mario Boella, Italy
Katsumasa Fujita, Osaka University, Japan
Xin Chen, Corning Inc, USA
Lei Su, University of Liverpool, United Kingdom
Xiaoke Yi, University of Sydney, Australia
Chen Liu, University of Huazhong tech, China
Filippo Scotti, CNIT - National Laboratory of Photonic Networks, Italy
Hongwei Chen, Tsinghua University, China
Eric Bernier, Huawei Technology, Canada
Chongjin Xie, Alibaba Group, USA
Dong-Il Yeom, Ajou University, Korea
Akira Shirakawa, University of Electro-Communications, Japan
Lili Hu, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Yi Cai, ZTE TX, USA
Xiang Liu, Huawei Technologies, USA
Hideaki Furukawa, National Institute of Information and Communications Technology, Japan
Jie Zhang, Beijing University of Posts and Telecommunications, China
Chau-Hwang Lee, Research Center for Applied Sciences, Academia Sinica, Taiwan
Chia-Lung Hsieh, Institute of Atomic and Molecular Sciences, Academia Sinica, Taiwan
Chulhong Kim, Pohang University of Science and Technology, Korea
Huabei Jiang, University of Florida, USA
Mei-Ling Zheng, Technical Institute of Physics and Chemistry, CAS, China
J.-C. Valmalette, Université de Toulon, France
Cheng chen, Shanghai Second Polytechnic University, China
Amos Martinez, Nature Publishing Group, United Kingdom
Hai Luo, Shanghai Normal University,China
Xianping Wang, Jiangxi Normal University, China
Changrui Liao, Shenzhen University, China
Nan Chi, Fudan University, China
Shintaro Arai, National Institute of Technology, Kagawa College, Japan
Yiping Wang, Shenzhen University, China
Wei Jin, The Hong Kong Polytechnic University & The Hong Kong Polytechnic University Shenzhen Research Institute, Hong Kong, China
Sebastien Loranger, Polytechnique Montreal, Canada
Haiwen Cai, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, China
Laurent Vivien, Institut d’Electronique Fondamentale (IEF), Univ. Paris-Sud, France
Lars Zimmermann, IHP & Technical University of Berlin, Germany
Guilhem de Valicourt, Bell Labs, Alcatel-Lucent, USA
Yong-Zhen Huang, State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, China
Dario Gerace, Dipartimento di Fisica, Università di Pavia, Italy
Masaya Notomi, 1 Nanophotonics Center, NTT Corporation, Japan, 2 NTT Basic Research Laboratories, NTT Corporation, Japan
Stefano Sanguinetti, L-NESS and Dipartimento di Scienza dei Materiali Università di Milano Bicocca Milano, Italy
Christian Koos, 1 Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT), Germany. 2 Institute of Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT), Germany.
Shinji Matsuo, 1 NTT Device Technology Laboratories, NTT Corporation, 2 Nanophotonics Center, NTT Corporation, Japan
Minghao Qi, Purdue University, China
Fabrice Raineri, Laboratoire de Photonique et de Nanostructures (CNRS-UPR20), France
Jens Richter, Institute for Integrated Photonics, Germany
Po Dong, Bell labs, Alcatel-Lucent, USA
Bernhard Spinnler, Coriant R&D GmbH, Germany
Karen Solis-Trapala, National Institute of Advanced Industrial Science and Technology (AIST) Tsukuba, Japan
Ying Zhao, Fujitsu Research and Development Center, China
Yasushi Fujimoto, Osaka University, Japan
William Wadsworth, University of Bath, United Kingdom
Jiahui Peng, Huazhong University of Science and Technology, China
Yoonchan Jeong, Seoul National University, Korea
Kiyo Ishii, National Institute of Advanced Industrial Science and Technology, Japan
Thibaut Sylvestre, University of Franche-Comté, France
Luc Thevenaz, EPFL Swiss Federal Institute of Technology, Switzerland
Pacal Besnard, ENSSAT-FOTON Laboratory, France
Benjamin Eggleton, The University of Sydney, Australia
Thomas. Schneider, Institut für Hochfrequenztechnik, Technische Universität Braunschweig, Germany
Wei WEI, Shanghai Jiao Tong University, China
Moshe Tur, Tel-Aviv University, Israel
Feng-Qi Liu, Institute of Semiconductors, Chinese Academy of Sciences, China
Ming Li, 1 Institute of Semiconductors, Chinese Academy of Sciences, China. 2 University of Ottawa, Canada, 3 Matériaux et Télécommunications, Canada
Ian Coddington, National Institute of Standards and Technology, USA
Young-Jin Kim, Nanyang Technological University, Singapore
Satoshi Ohara, Osaka University, Japan
Qiang Wu, Nankai University, China
Taima Tetsuya, Kanazawa Unversity, Japan
Anh T. Pham, The University of Aizu, Japan
Nan-Kuang Chen, National United University, Taiwan
Wei Shi, COPL, Canada
Wenxuan Liang, Johns Hopkins University, USA
Pinghe Wang, University of Electronic Science and Technology of China, China
Ping Qiu, Shenzhen University, China
Keiichi Nakagawa, The University of Tokyo, Japan
Yanlong Yang, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, China
Tong, Zhejiang University, China
G T Reed, University of Southampton, United Kingdom
Seok-Hwan Jeong, Photonics Electronics Technology Research Association, Japan
Joel Carpenter, The University of Queensland, Australia
Xu Wang, Lumerical Solutions, Inc., Canada
Kotaro Takeda, 1 NTT Device Technology Laboratory, Japan. 2 NTT Nanophotonics Center, Japan
P. De Dobbelaere, Luxtera Inc., USA
Douglas M. Gill, IBM T. J. Watson Research Center, USA
Olivier Castany, CEA, LETI, MINATEC DOPT Grenoble, France
Tohru Mogami, Photonics Electronics Technology Research Association (PETRA), Japan
He Huang, SMICS, China
Hidehiko Takara, NTT Network Innovation Laboratories, NTT Corporation, Japan
R.-J. Essiambre, Bell Laboratories, Alcatel-Lucent, USA
Akihiro Maruta, Graduate School of Engineering, Osaka University, Japan
S.T. Le, Aston University, United Kingdom.
Alexandre Graell i Amat, Chalmers University of Technology, Sweden
Hussam G, TE SubCom, USA
Qunbi Zhuge, 1 Ciena Corporation, Canada, 2 McGill University, Canada
Xiaoyuan Cao, KDDI R&D Laboratories, Japan
Tomoyuki Kato, Fujitsu Laboratories, Japan
Weiqi Xue, Technical University of Denmark, Denmark
Tomohiro Amemiya, Tokyo Institute of Technology, Japan
Fumihiko Ito, Shimane University, Japan
Hideaki Murayama, The Univsesity of Tokyo, Japan
Fei Xu, Nanjing University, China
Pilhan Kim, Korea Advanced Institute of Science and Technology, Korea
Kevin Tsia, The University of Hong Kong, Hong Kong
F. Y. Gardes, Optoelectronics Research Centre, University of Southampton, United Kingdom
D. Van Thourhout, Photonics Research Group, INTEC, Belgium, 2 Center for Nano- and Biophotonics Ghent University, Ghent, Belgium
Christian Grillet, University of Lyon, France
L.Carletti, University of Lyon, France
Bart Kuyken, Ghent University – imec, Belgium
Hua Ji, Techcal University of Denmark, Denmark